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2518 Charge Trapping


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                                    A   G R E AT E R     M E A S U R E      O F    C O N F I D E N C E   C-V, I-V, and charge-pumping. From these
                                                                                                         measurements, important device parameters
                                                                                                         can be extracted and plotted as a function of
                                                                                                         time to show the degradation caused by the
                                                                                                         stresses.
                                                                                                             Stress and C-V Measurements [5]. In this
                                                                                                         measurement, the device under test (DUT)
                                                                                                         usually is a MOS capacitor. A C-V sweep is



Qualifying High 
                                                                                                         performed on the DUT before and after volt-
                                                                                                         age stress. The C-V sweep can be a full sweep
                                                                                                         from inversion to accumulation, so that a flat


Gate Materials with
                                                                                                         band voltage can be calculated by quantum
                                                                                                         mechanical modeling. However, a faster and
                                                                                                         easier way is to do the voltage sweep in a


Charge-Trapping
                                                                                                         relatively small voltage range around an esti-
                                                                                                         mated flat band. The flat band voltage is then
                                                                                                         extracted from the C-V data. Either a single


Measurements                                                                                             sweep or bi-directional sweep can be used;
                                                                                                         a bi-directional sweep will show any hyster-
                                                                                                         esis effects. Flat band voltage as a function
                                                                                                         of stress time or injected charge provides in-
Yuegang Zhao, Keithley Instruments, Inc.,                                                                formation on how much charge is trapped in
                                                                                                         the gate stack structure. The trapped charge
Chadwin D. Young and George Brown,                                                                       may be characterized by an effective value
International SEMATECH                                                                                   assumed to be located at the insulator-silicon
                                                                                                         interface (Qtrap), given by:
                                                                                                            Qtrap = Cgate 



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